Semiconductor resist "SML Resist / PMMA Resist"

■ This is an article posted on June 2019, 7, so the content of the information may be out of date.

Unipos website is a resist (photosensitive material) used in electron beam lithography in semiconductor processing. SML Resist / PMMA Resist Page has been added.

EM Resist, a UK company that specializes in electron beam lithography and nanofabrication materials for over 20 years, SML Resist / PMMA Resist We handle two types of resist.


SML Resist

A specially designed new resist that enables simultaneous patterning of high resolution and high aspect ratio patterns without using proximity correction even at low accelerating voltage.
The resist film thickness can be selected from 50nm / 100nm / 300nm / 600nm / 1000nm / 2000nm.

PMMA Resist

Industry standard PMMA (polymethylmethacrylate) resist.
You can choose the molecular weight from 950,000 / 495,000 / 350,000 / 120,000 / 35,000.
Dilutions can be specified from A2 to A12.