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Home > engineering > Why choose EM Resist's products (Electron Beam Resist/Photoresist)

Why choose EM Resist's products (Electron Beam Resist/Photoresist)

2024/12/2 TEGARA Co., Ltd. Mathematical Science, engineering, Robotics, Overseas Products What's New (Unipos)

Unipos, an overseas product procurement and consultation service, offers electrode materials from various manufacturers.

This time, we will be introducing a British company that specializes in the development of materials for electron beam lithography and nanofabrication. EM ResistWe would like to introduce our products to you.

table of contents

  • Why choose EM Resist?
    • EM Resist Resist List
  • Introduction of usage examples
    • Case study by Dr. Kevin Hofhuis of the Paul Scherrer Institute (Switzerland)
    • Case study by Dr. Jiho Yoon of Max Planck Institute (Germany)
    • Case study by Dr. Damien Eschimese of XRnanotech (Switzerland)
  • Flexible response to your needs

Why choose EM Resist?

EM Resist offers a wide range of high quality e-beam resists and photoresists, from HSQ to PMMA to SU-8.

The company's products have a wide range of applications, including electron beam lithography (ebeam lithography) for semiconductors and in the photonics field, as well as many users who use the company's products for optical devices such as Fresnel lenses and silicon photonics, and they are used in all kinds of micro- and nano-fabrication laboratories.

EM Resist's SML resists are high aspect ratio positive resists that have superior etch resistance compared to PMMA resists and can be used as an alternative to ZEP resists in certain applications.

Another reason why Resist Technology's products are chosen is because of its flexible services that are tailored to customers' research and development, such as detailed support from Resist Technology's expert staff regarding products and applications before purchase, and compounding services based on customer requests.

EM Resist Resist List

  Positive type Negative type
Electron Beam Resist
  • SML Resist
  • PMMA Resist
  • HSQ Resist
Photoresist -
  • SU-8 Resist

Introduction of usage examples

HSQ Resist, a standard EM Resist product, has been newly formulated and is now available in concentrations ranging from 1% to 40%.

The newly formulated HSQ Resist has been developed using a unique manufacturing technology that improves material stability and in-edge roughness (LER), thereby reducing costs for users. Some users are considering using it as an alternative to FOX.

Below are some actual use cases.

Case study by Dr. Kevin Hofhuis of the Paul Scherrer Institute (Switzerland)

HSQ Resist: 2% Solution

Paul Scherrer Institute PSI
https://www.psi.ch/en

Case study by Dr. Jiho Yoon of Max Planck Institute (Germany)

HSQ Resist: 6% Solution

The Max Planck Society for the Advancement of Science
https://www.mpg.de/en

Case study by Dr. Damien Eschimese of XRnanotech (Switzerland)

HSQ Resist: 20% Solution

X-ray optics | XRnanotech
https://www.xrnanotech.com/

Download

Click on the image on the left to download the HSQ Resist flyer.

Flexible response to your needs

EM Resist also offers custom services to meet customer needs.
We can accommodate your needs with sizes ranging from 250 mL to drum size.
We are happy to discuss any customization requests you may have, from changing the concentration of an existing manufacturer's product to custom blends.
Furthermore, if the blend content completed at the development stage is to be produced on a large scale, EM Resist can provide integrated support, from production to packaging and labelling.

Services | EM Resist Ltd
https://www.emresist.com/services

If you would like to use it, please let us know your purpose.

■ Click here for product details and inquiries

Various resists manufactured by EM Resist | Semiconductor resists

Manufacturer (EM Resist Ltd.) Website

  • Circuit design
  • semiconductor
  • Electronic circuit
  • photonics

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